我們的計(jì)量工具可以測(cè)量 N2 半導(dǎo)體工藝多層 GAA 結(jié)構(gòu)並以原子級(jí)分辨率監(jiān)控關(guān)鍵尺寸。 與競(jìng)爭(zhēng)對(duì)手相比，該工具減少了 90% 的測(cè)量時(shí)間。 目標(biāo)市場(chǎng)包括半導(dǎo)體 N2 節(jié)點(diǎn)以下的代工廠和存儲(chǔ)器。

Our metrology tool can measure the N2 semiconductor process multilayer GAA structure and monitor critical dimensions with atomic-level resolution. Compared with its competitors, the tool has reduced measurement time by 90%. The target market includes foundry and memory below semiconductor N2 node.